ZnO thin films produced by filtered cathodic vacuum arc technique

K. Y. Tse, H. H. Hng, Shu Ping Lau, Y. G. Wang, Siu Fung Yu

Research output: Journal article publicationConference articleAcademic researchpeer-review

20 Citations (Scopus)


High quality c-axis oriented ZnO thin films have been successfully deposited on silicon substrates using filtered cathodic vacuum arc (FCVA) technique. Two deposition temperatures, namely room temperature and 420°C, were studied. The films were characterised by X-ray diffraction (XRD), scanning electron microscopy (SEM) and transmission electron microscopy (TEM). XRD revealed that the ZnO films exhibited (002) orientation. An amorphous layer between the substrate and the ZnO film was observed in both samples using TEM. Both samples showed c-axis oriented ZnO columns. However, for the ZnO thin film deposited at room temperature, the c-axis oriented ZnO columns were observed to grow on a layer of randomly oriented nanocrystals.
Original languageEnglish
Pages (from-to)1669-1674
Number of pages6
JournalCeramics International
Issue number7
Publication statusPublished - 7 Sept 2004
Externally publishedYes
Event3rd Asian Meeting on Electroceramics - Singapore, Singapore
Duration: 7 Dec 200311 Dec 2003


  • A. Films
  • B. Electron microscopy
  • D. ZnO

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Process Chemistry and Technology
  • Surfaces, Coatings and Films
  • Materials Chemistry


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