XPS investigation of Upilex-S polyimide ablated by 355 nm Nd:YAG laser irradiation

Kam Chuen Yung, D. W. Zeng, Tai Man Yue

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Abstract

Laser ablation of Upilex-S polyimide films 80 μm thick was performed using a 355 nm pulsed Nd:YAG laser. Nanoparticles redeposited at the ablated zone and at the edge of the hole were observed. Chemical and structural changes of the Upilex-S polyimide surface after 355 nm laser irradiation in air were analyzed by X-ray photoelectron spectroscopy (XPS). Relative C content in the ablated zone was found to be higher, while both O and N contents were lower than in the untreated area. This indicates that laser irradiation released O and N atoms, and that the nanoparticles formed in the ablated zone consist mainly of carbon clusters. After deconvoluting the C 1s and O 1s spectra, three new components related to the carboxylate (O-C double bond O), ether (C-O), and qqC double bond O groups were detected in and around the ablated zone. In addition, one new component was found for O 1s spectra, and the peak at 288.2 eV related to the imide carbonyl groups was shifted by 0.2-0.6 eV. These effects are probably due to the oxidation and formation of a non-imide carbonyl group. At the edge of the hole enhanced oxidation was found: the C content was considerably lower than that in the ablated zone, and the C 1s peak was at 288.6±0.2 eV. This suggests the formation of oxidized nano-particles, which carry the non-imide carbonyl groups. Based on these results, the decomposition of Upilex-S polyimide irradiated by UV light occurs via a photothermal ablation process.
Original languageEnglish
Pages (from-to)193-202
Number of pages10
JournalApplied Surface Science
Volume173
Issue number3-4
DOIs
Publication statusPublished - 29 Mar 2001

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

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