Wide tunable ultraviolet random lasing action from ZnMgo thin films

Hui Ying Yang, Siu Fung Yu, Shu Ping Lau

Research output: Journal article publicationJournal articleAcademic researchpeer-review

9 Citations (Scopus)


Ultraviolet random lasing action with a tunable wavelength between 375 and 400 nm has been realized from highly disordered Zn1-xMgxO (for 0≤x≤0.3) polycrystalline thin films deposited on silicon substrates by the filtered cathodic vacuum arc technique. The emission energy can be continuously tuned within the ranges of 3.10-3.31 eV, while the corresponding lasing threshold remained relatively uniform.
Original languageEnglish
Pages (from-to)16-18
Number of pages3
JournalJournal of Crystal Growth
Issue number1
Publication statusPublished - 15 Dec 2009
Externally publishedYes


  • Random lasing
  • Thin film
  • Wavelength tunable
  • ZnMgO
  • ZnO

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry


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