Wide tunable ultraviolet random lasing action from ZnMgo thin films

Hui Ying Yang; Siu Fung Yu; Shu Ping Lau

doi:10.1016/j.jcrysgro.2009.10.004

Wide tunable ultraviolet random lasing action from ZnMgo thin films

Hui Ying Yang, Siu Fung Yu, Shu Ping Lau

Research output: Journal article publication › Journal article › Academic research › peer-review

9 Citations (Scopus)

Abstract

Ultraviolet random lasing action with a tunable wavelength between 375 and 400 nm has been realized from highly disordered Zn1-xMgxO (for 0≤x≤0.3) polycrystalline thin films deposited on silicon substrates by the filtered cathodic vacuum arc technique. The emission energy can be continuously tuned within the ranges of 3.10-3.31 eV, while the corresponding lasing threshold remained relatively uniform.

Original language	English
Pages (from-to)	16-18
Number of pages	3
Journal	Journal of Crystal Growth
Volume	312
Issue number	1
DOIs	https://doi.org/10.1016/j.jcrysgro.2009.10.004
Publication status	Published - 15 Dec 2009
Externally published	Yes

Keywords

Random lasing
Thin film
Wavelength tunable
ZnMgO
ZnO

ASJC Scopus subject areas

Condensed Matter Physics
Inorganic Chemistry
Materials Chemistry

More information

10.1016/j.jcrysgro.2009.10.004

Cite this

@article{2a8c5d4e556741c9a8e8ef53f5eb291b,

title = "Wide tunable ultraviolet random lasing action from ZnMgo thin films",

abstract = "Ultraviolet random lasing action with a tunable wavelength between 375 and 400 nm has been realized from highly disordered Zn1-xMgxO (for 0≤x≤0.3) polycrystalline thin films deposited on silicon substrates by the filtered cathodic vacuum arc technique. The emission energy can be continuously tuned within the ranges of 3.10-3.31 eV, while the corresponding lasing threshold remained relatively uniform.",

keywords = "Random lasing, Thin film, Wavelength tunable, ZnMgO, ZnO",

author = "{Ying Yang}, Hui and {Fung Yu}, Siu and Lau, {Shu Ping}",

year = "2009",

month = dec,

day = "15",

doi = "10.1016/j.jcrysgro.2009.10.004",

language = "English",

volume = "312",

pages = "16--18",

journal = "Journal of Crystal Growth",

issn = "0022-0248",

publisher = "Elsevier",

number = "1",

}

TY - JOUR

T1 - Wide tunable ultraviolet random lasing action from ZnMgo thin films

AU - Ying Yang, Hui

AU - Fung Yu, Siu

AU - Lau, Shu Ping

PY - 2009/12/15

Y1 - 2009/12/15

N2 - Ultraviolet random lasing action with a tunable wavelength between 375 and 400 nm has been realized from highly disordered Zn1-xMgxO (for 0≤x≤0.3) polycrystalline thin films deposited on silicon substrates by the filtered cathodic vacuum arc technique. The emission energy can be continuously tuned within the ranges of 3.10-3.31 eV, while the corresponding lasing threshold remained relatively uniform.

AB - Ultraviolet random lasing action with a tunable wavelength between 375 and 400 nm has been realized from highly disordered Zn1-xMgxO (for 0≤x≤0.3) polycrystalline thin films deposited on silicon substrates by the filtered cathodic vacuum arc technique. The emission energy can be continuously tuned within the ranges of 3.10-3.31 eV, while the corresponding lasing threshold remained relatively uniform.

KW - Random lasing

KW - Thin film

KW - Wavelength tunable

KW - ZnMgO

KW - ZnO

UR - http://www.scopus.com/inward/record.url?scp=70449504724&partnerID=8YFLogxK

U2 - 10.1016/j.jcrysgro.2009.10.004

DO - 10.1016/j.jcrysgro.2009.10.004

M3 - Journal article

SN - 0022-0248

VL - 312

SP - 16

EP - 18

JO - Journal of Crystal Growth

JF - Journal of Crystal Growth

IS - 1

ER -

Wide tunable ultraviolet random lasing action from ZnMgo thin films

Abstract

Keywords

ASJC Scopus subject areas

More information

Other files and links

Fingerprint

Cite this