Wettability transition of plasma-treated polystyrene micro/nano pillars-aligned patterns

J. Kong, Kai Leung Yung, Y. Xu, W. Tian

Research output: Journal article publicationJournal articleAcademic researchpeer-review

14 Citations (Scopus)

Abstract

This paper reports the wettability transition of plasma-treated polystyrene (PS) micro/nano pillars-aligned patterns. The micro/nano pillars were prepared using hot embossing on silicon microporous template and alumina nanoporous template, which were fabricated by ultraviolet (UV) lithography and inductive coupled plasma (ICP) etching, and two-step anodic oxidation, respectively. The results indicate that the combination of micro/nano patterning and plasma irradiation can easily regulate wettabilities of PS surfaces, i.e. from hydrophilicity to hydrophobicity, or from hydrophobicity to superhydrophilicity. During the wettability transition from hydrophobicity to hydrophilicity there is only mild hydrophilicity loss. After plasma irradiation, moreover, the wettability of PS micro/nano pillars-aligned patterns is more stable than that of flat PS surfaces. The observed wettability transition and wettability stability of PS micro/nano pillars-aligned patterns are new phenomena, which may have potential in creating programmable functional polymer surfaces.
Original languageEnglish
Pages (from-to)753-762
Number of pages10
JournalExpress Polymer Letters
Volume4
Issue number12
DOIs
Publication statusPublished - 1 Dec 2010

Keywords

  • Nanomaterials
  • Nanopillars
  • Patterns
  • Wettability

ASJC Scopus subject areas

  • Chemical Engineering(all)
  • Physical and Theoretical Chemistry
  • Polymers and Plastics
  • Organic Chemistry
  • Materials Chemistry

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