Weak ferromagnetism of HfO2film on compressively strained Si83Ge17/Si substrate

Y. T. Tu; G. D. Zhou; Jiyan Dai; J. Li; P. Chen; X. Y. Qiu

doi:10.1080/10584587.2012.663647

Weak ferromagnetism of HfO₂film on compressively strained Si₈₃Ge₁₇/Si substrate

Y. T. Tu
, G. D. Zhou
, Jiyan Dai
, J. Li
, P. Chen
, X. Y. Qiu

Research output: Journal article publication › Conference article › Academic research › peer-review

Original language	English
Article number	663647
Pages (from-to)	10-12
Number of pages	3
Journal	Integrated Ferroelectrics
Volume	134
Issue number	1
DOIs	https://doi.org/10.1080/10584587.2012.663647
Publication status	Published - 24 May 2012
Event	International Symposium on Integrated Functionalities, ISIF 2011 - Cambridge, United Kingdom Duration: 31 Jul 2011 → 4 Aug 2011

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Control and Systems Engineering
Ceramics and Composites
Condensed Matter Physics
Electrical and Electronic Engineering
Materials Chemistry

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10.1080/10584587.2012.663647

Cite this

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title = "Weak ferromagnetism of HfO2film on compressively strained Si83Ge17/Si substrate",

author = "Tu, \{Y. T.\} and Zhou, \{G. D.\} and Jiyan Dai and J. Li and P. Chen and Qiu, \{X. Y.\}",

year = "2012",

month = may,

day = "24",

doi = "10.1080/10584587.2012.663647",

language = "English",

volume = "134",

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journal = "Integrated Ferroelectrics",

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TY - JOUR

T1 - Weak ferromagnetism of HfO2film on compressively strained Si83Ge17/Si substrate

AU - Tu, Y. T.

AU - Zhou, G. D.

AU - Dai, Jiyan

AU - Li, J.

AU - Chen, P.

AU - Qiu, X. Y.

PY - 2012/5/24

Y1 - 2012/5/24

UR - https://www.scopus.com/pages/publications/84862080259

U2 - 10.1080/10584587.2012.663647

DO - 10.1080/10584587.2012.663647

M3 - Conference article

SN - 1058-4587

VL - 134

SP - 10

EP - 12

JO - Integrated Ferroelectrics

JF - Integrated Ferroelectrics

IS - 1

M1 - 663647

T2 - International Symposium on Integrated Functionalities, ISIF 2011

Y2 - 31 July 2011 through 4 August 2011

ER -

Weak ferromagnetism of HfO2film on compressively strained Si83Ge17/Si substrate

ASJC Scopus subject areas

More information

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Weak ferromagnetism of HfO₂film on compressively strained Si₈₃Ge₁₇/Si substrate