Abstract
Atomically thin two-dimensional (2D) semiconductors are attractive channel materials for next-generation field-effect transistors (FETs). The high-performance 2D electronics requires high-quality integration of high-κ dielectrics, which however remains a significant challenge. In this mini-review, we provide a brief introduction on recent progress in the van der Waals (vdW) integration of high-κ dielectrics onto 2D semiconductors. We first highlight the importance of high-κ dielectric integration for 2D FETs. Next, we summarize the recent breakthroughs in the various vdW integrations of high-κ dielectrics with 2D semiconductors, along with their interfaces’ properties. Additionally, we examine the quasi-vdW integration of conventional high-κ dielectrics onto 2D semiconductors. Finally, we discuss the challenges and potential future research directions in this field.
| Original language | English |
|---|---|
| Article number | 014301 |
| Journal | Frontiers of Physics |
| Volume | 20 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - Feb 2025 |
Keywords
- high-κ dielectrics
- two-dimensional semiconductor
- van der Waals interface
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)
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