Van der Waals enabled formation and integration of ultrathin high-κ dielectrics on 2D semiconductors

Keyphrases

• Van Der Waals 100%
• Ultrathin 100%
• High-k Dielectric 100%
• 2D Materials 100%
• 2D Semiconductors 100%
• Dielectric Layer 60%
• Material-based 40%
• Atomic Layer Deposition 40%
• Plasma Treatment 20%
• Photonics 20%
• Dielectric 20%
• Binding Energy 20%
• MOSFET 20%
• Thin Dielectric 20%
• Flat Surface 20%
• Hexagonal Boron Nitride (h-BN) 20%
• Gate Dielectric 20%
• Surface Interface 20%
• Density Functional Calculations 20%
• Raman Measurements 20%
• Leakage Current 20%
• X-ray Photoelectron Spectroscopy Analysis 20%
• Device Application 20%
• Photoluminescence Measurements 20%
• Weak Binding 20%
• Electronic Devices 20%
• Electronic Applications 20%
• Van Der Waals Heterostructures 20%
• Atomically Thin 20%
• Photonic Applications 20%
• Unintentional Doping 20%
• Direct Deposition 20%
• Clean Interface 20%
• Monolayer WS2 20%
• Dielectric Film 20%
• Thin Dielectric Layers 20%

Material Science

• Dielectric Material 100%
• Two-Dimensional Material 71%
• Monolayers 14%
• Photoluminescence 14%
• Heterojunction 14%
• Metal-Oxide-Semiconductor Field-Effect Transistor 14%
• Boron Nitride 14%
• Surface (Surface Science) 14%
• Density 14%
• X-Ray Photoelectron Spectroscopy 14%
• Dielectric Films 14%
• Thin Dielectric Layer 14%