Use of the ultraviolet absorption spectrum of CF2to determine the spatially resolved absolute CF2density, rotational temperature, and vibrational distribution in a plasma etching reactor

Nicolas Bulcourt, Jean Paul Booth, Eric A. Hudson, Jorge Luque, Kam Wah Mok, P. Lee Edmond, Foo Tim Chau, John M. Dyke

Research output: Journal article publicationJournal articleAcademic researchpeer-review

35 Citations (Scopus)


The CF2densities in a plasma etch reactor used for industrial wafer processing were determined using broadband ultraviolet absorption spectroscopy. The absorption cross sections of CF2at selected wavelengths, used for calculating the number densities from the experimental spectra were determined using Franck Condon factors. The number densities of CF2were also determined in different regions of the plasma, including the center of the plasma and outside the plasma volume. The CF2rotational temperatures and vibrational energy distributions were also estimated.
Original languageEnglish
Pages (from-to)9499-9508
Number of pages10
JournalJournal of Chemical Physics
Issue number20
Publication statusPublished - 22 May 2004

ASJC Scopus subject areas

  • Physics and Astronomy(all)
  • Physical and Theoretical Chemistry

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