Ultraviolet Lasers Realized via Electrostatic Doping Method

X. Y. Liu, C. X. Shan, H. Zhu, B. H. Li, M. M. Jiang, Siu Fung Yu, D. Z. Shen

Research output: Journal article publicationJournal articleAcademic researchpeer-review

15 Citations (Scopus)

Abstract

P-type doping of wide-bandgap semiconductors has long been a challenging issue for the relatively large activation energy and strong compensation of acceptor states in these materials, which hinders their applications in ultraviolet (UV) optoelectronic devices drastically. Here we show that by employing electrostatic doping method, hole-dominant region can be formed in wide bandgap semiconductors, and UV lasing has been achieved through the external injection of electrons into the hole-dominant region, confirming the applicability of the p-type wide bandgap semiconductors realized via the electrostatic doping method in optoelectronic devices.
Original languageEnglish
Article number13641
JournalScientific Reports
Volume5
DOIs
Publication statusPublished - 1 Sept 2015

ASJC Scopus subject areas

  • General

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