Two-step interfacial reaction of HfO2 high-k gate dielectric thin films on Si

Jiyan Dai, P.F. Lee, H.L.W. Chan, C.L. Choy

Research output: Unpublished conference presentation (presented paper, abstract, poster)Conference presentation (not published in journal/proceeding/book)Academic researchpeer-review


ConferenceInternational Conference on Materials for Advanced Technologies [ICMAT]||International Union of Materials Research Societies - International Conference in Asia [IUMRS-ICA]
Period1/01/03 → …

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