Keyphrases
Three-dimensional (3D)
100%
Large Grain
100%
Silicon-on-insulator
100%
Polysilicon Film
100%
Polysilicon
100%
CMOS Integrated Circuits
100%
Insulator Film
100%
Large Gain
100%
High Performance
50%
Recrystallization
50%
Amorphous Silicon
50%
Oxides
50%
Elevated Temperature
50%
Transistor
50%
Metal-induced Crystallization
50%
Propagation Delay
50%
3D Circuits
50%
Circuit Area
50%
Dynamic Power Consumption
50%
Low-voltage Circuits
50%
Delay Dynamics
50%
Amorphous Crystallization
50%
Interlayer Dielectric
50%
Low Dynamics
50%
Material Science
Electronic Circuit
100%
Film
100%
Silicon
40%
Recrystallization
20%
Transistor
20%
Amorphous Silicon
20%
Oxide Compound
20%
Dielectric Material
20%