Keyphrases
Plasma-enhanced Chemical Vapor Deposition (PECVD)
100%
Hexagonal Boron Nitride (h-BN)
100%
Boron Nitride Film
100%
Graphene
22%
Monolayer Hexagonal Boron Nitride
22%
Pt Foils
22%
High Temperature
11%
Silica
11%
Room Temperature
11%
Annealing
11%
Crystallinity
11%
Buffer Layer
11%
Optical Properties
11%
Electrical Properties
11%
Smooth Surface
11%
Deposition Time
11%
Few-layer
11%
Capping Layer
11%
Insulating Materials
11%
Centimeter-scale
11%
Foil Substrate
11%
Material Performance
11%
Two Dimensional Materials
11%
Dangling Bonds
11%
Charge Blocking Layer
11%
Borazine
11%
2D Hexagonal Boron Nitride
11%
Synthesis of Monolayer
11%
Material Science
Boron Nitride
100%
Plasma-Enhanced Chemical Vapor Deposition
100%
Film
100%
Monolayers
25%
Graphene
16%
Surface (Surface Science)
16%
Two-Dimensional Material
8%
Buffer Layer
8%
Insulating Material
8%
Optical Property
8%