Thickness-controlled multilayer hexagonal boron nitride film prepared by plasma-enhanced chemical vapor deposition

Ji Hoon Park, Soo Ho Choi, Jiong Zhao, Seunghyun Song, Woochul Yang, Soo Min Kim, Ki Kang Kim, Young Hee Lee

Research output: Journal article publicationJournal articleAcademic researchpeer-review

20 Citations (Scopus)


Two-dimensional (2D) hexagonal boron nitride (h-BN) is a thin insulating material that can be used to enhance the electrical and optical properties of other 2D materials when used as a substrate or a capping layer, owing to its absence of dangling bonds on the surface. The use of multilayer h-BN films is often required in such applications to realize high material performance. However, previous works have focused mostly on the synthesis of monolayer or few-layer h-BN films. Herein we report a method to control the thickness of h-BN film up to the centimeter scale by means of plasma-enhanced chemical vapor deposition (PECVD). The thickness of the h-BN film is controlled by varying the deposition time of borazine precursor onto a monolayer h-BN film on a Pt foil substrate at room temperature. The resultant film is then annealed at high temperature (1050 °C) to increase the crystallinity of the h-BN. Monolayer h-BN film grown on Pt foil used as a buffer layer is of importance to improve uniformity and smooth surface of the multilayer h-BN film over the whole area. We further demonstrate that our multilayer h-BN film is very useful in graphene/h-BN/SiO2heterostructures as a charge-blocking layer between graphene and SiO2.
Original languageEnglish
Pages (from-to)1229-1235
Number of pages7
JournalCurrent Applied Physics
Issue number9
Publication statusPublished - 1 Sept 2016
Externally publishedYes


  • Hexagonal boron nitride
  • Plasma-enhanced chemical vapor deposition
  • Platinum foil
  • Thickness control

ASJC Scopus subject areas

  • General Materials Science
  • General Physics and Astronomy


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