Abstract
A system capable of measuring photoreflectance and phoiodisplacement phenomena simultaneously is described. Results are presented showing the imaging performance of the system, and the applications to semiconductor and thin-film characterization are discussed.
| Original language | English |
|---|---|
| Pages (from-to) | 71-76 |
| Number of pages | 6 |
| Journal | International Journal of Electronics |
| Volume | 77 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - 1 Jan 1994 |
| Externally published | Yes |
ASJC Scopus subject areas
- Electrical and Electronic Engineering