Thermal wave probe microscopy for materials characterization

M. B. Suddendorf; Michael Geoffrey Somekh; M. Liu

doi:10.1080/00207219408926035

Thermal wave probe microscopy for materials characterization

M. B. Suddendorf, Michael Geoffrey Somekh, M. Liu

Research output: Journal article publication › Journal article › Academic research › peer-review

1 Citation (Scopus)

Abstract

A system capable of measuring photoreflectance and phoiodisplacement phenomena simultaneously is described. Results are presented showing the imaging performance of the system, and the applications to semiconductor and thin-film characterization are discussed.

Original language	English
Pages (from-to)	71-76
Number of pages	6
Journal	International Journal of Electronics
Volume	77
Issue number	1
DOIs	https://doi.org/10.1080/00207219408926035
Publication status	Published - 1 Jan 1994
Externally published	Yes

ASJC Scopus subject areas

Electrical and Electronic Engineering

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10.1080/00207219408926035

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@article{4547e844d4ed4a7f853532a50153b053,

title = "Thermal wave probe microscopy for materials characterization",

abstract = "A system capable of measuring photoreflectance and phoiodisplacement phenomena simultaneously is described. Results are presented showing the imaging performance of the system, and the applications to semiconductor and thin-film characterization are discussed.",

author = "Suddendorf, {M. B.} and Somekh, {Michael Geoffrey} and M. Liu",

year = "1994",

month = jan,

day = "1",

doi = "10.1080/00207219408926035",

language = "English",

volume = "77",

pages = "71--76",

journal = "International Journal of Electronics",

issn = "0020-7217",

publisher = "Taylor and Francis Ltd.",

number = "1",

}

TY - JOUR

T1 - Thermal wave probe microscopy for materials characterization

AU - Suddendorf, M. B.

AU - Somekh, Michael Geoffrey

AU - Liu, M.

PY - 1994/1/1

Y1 - 1994/1/1

N2 - A system capable of measuring photoreflectance and phoiodisplacement phenomena simultaneously is described. Results are presented showing the imaging performance of the system, and the applications to semiconductor and thin-film characterization are discussed.

AB - A system capable of measuring photoreflectance and phoiodisplacement phenomena simultaneously is described. Results are presented showing the imaging performance of the system, and the applications to semiconductor and thin-film characterization are discussed.

UR - http://www.scopus.com/inward/record.url?scp=0343741884&partnerID=8YFLogxK

U2 - 10.1080/00207219408926035

DO - 10.1080/00207219408926035

M3 - Journal article

SN - 0020-7217

VL - 77

SP - 71

EP - 76

JO - International Journal of Electronics

JF - International Journal of Electronics

IS - 1

ER -

Thermal wave probe microscopy for materials characterization

Abstract

ASJC Scopus subject areas

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