The influence of ultra-precision machined patterns on self-cleaning properties

C.T. Cheng; Suet To; Ching Yuen Chan; Chi Fai Cheung; Wing Bun Lee

The influence of ultra-precision machined patterns on self-cleaning properties

C.T. Cheng, Suet To, Ching Yuen Chan, Chi Fai Cheung, Wing Bun Lee

Research output: Unpublished conference presentation (presented paper, abstract, poster) › Conference presentation (not published in journal/proceeding/book) › Academic research › peer-review

Original language	English
Publication status	Published - 2010
Event	International Conference on Nanomanufacturing [nanoMan]\|CIRP Conference on Nanomanufacturing - Duration: 1 Jan 2010 → …

Conference

Conference	International Conference on Nanomanufacturing [nanoMan]\|CIRP Conference on Nanomanufacturing
Period	1/01/10 → …

Cite this

@conference{4aa1bef83afd4335a6275702b7dc1e4b,

title = "The influence of ultra-precision machined patterns on self-cleaning properties",

author = "C.T. Cheng and Suet To and Chan, {Ching Yuen} and Cheung, {Chi Fai} and Lee, {Wing Bun}",

year = "2010",

language = "English",

note = "International Conference on Nanomanufacturing [nanoMan]|CIRP Conference on Nanomanufacturing ; Conference date: 01-01-2010",

}

The influence of ultra-precision machined patterns on self-cleaning properties. / Cheng, C.T.; To, Suet ; Chan, Ching Yuen et al.
2010. Paper presented at International Conference on Nanomanufacturing [nanoMan]|CIRP Conference on Nanomanufacturing.

Research output: Unpublished conference presentation (presented paper, abstract, poster) › Conference presentation (not published in journal/proceeding/book) › Academic research › peer-review

TY - CONF

T1 - The influence of ultra-precision machined patterns on self-cleaning properties

AU - Cheng, C.T.

AU - To, Suet

AU - Chan, Ching Yuen

AU - Cheung, Chi Fai

AU - Lee, Wing Bun

PY - 2010

Y1 - 2010

M3 - Conference presentation (not published in journal/proceeding/book)

T2 - International Conference on Nanomanufacturing [nanoMan]|CIRP Conference on Nanomanufacturing

Y2 - 1 January 2010

ER -