Tensile strength of zinc oxide films measured by a microbridge method

Chung Wo Ong, D. G. Zong, M. Aravind, C. L. Choy, D. R. Lu

Research output: Journal article publicationJournal articleAcademic researchpeer-review

40 Citations (Scopus)


Double-layered ZnO/silicon nitride microbridges were fabricated for microbridge tests. In a test, a load was applied to the center of the microbridge specimen by using a microwedge tip, where the displacement was recorded as a function of load until the specimen broke. The silicon nitride layer in the structure served to enhance the robustness of the specimen. By fitting the data to a theory, the elastic modulus, residual stress, and tensile strength of the ZnO film were found to be 137 ± 18 GPa, -0.041 ± 0.02 GPa, and 0.412 ± 0.05 GPa, respectively. The analysis required the elastic modulus, internal stress, and tensile strength of the silicon nitride layer. They were measured separately by microbridge tests on single-layered silicon nitride microbridges. The measured tensile strength of the ZnO films represents the maximum tolerable tensile stress that the films can sustain when they are used as the functional component in devices.
Original languageEnglish
Pages (from-to)2464-2472
Number of pages9
JournalJournal of Materials Research
Issue number10
Publication statusPublished - 1 Jan 2003

ASJC Scopus subject areas

  • General Materials Science
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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