Synthesis and characterization of porous polymeric low dielectric constant films

Yuhuan Xu; D. W. Zheng; Yipin Tsai; K. N. Tu; Bin Zhao; Q. Z. Liu; Maureen Brongo; Chung Wo Ong; Chung Loong Choy; George T.T. Sheng; C. H. Tung

doi:10.1007/s11664-001-0036-9

Synthesis and characterization of porous polymeric low dielectric constant films

Yuhuan Xu, D. W. Zheng, Yipin Tsai, K. N. Tu, Bin Zhao, Q. Z. Liu, Maureen Brongo, Chung Wo Ong, Chung Loong Choy, George T.T. Sheng, C. H. Tung

Research output: Journal article publication › Journal article › Academic research › peer-review

23 Citations (Scopus)

Abstract

This paper reports the synthesis and dielectric properties of a porous poly(arylether) material with an ultra-low dielectric constant for interlayer dielectric applications in microelectronics. The porous polymer films were successfully fabricated by a method of organic phase separation and evaporation. A dielectric constant k of 1.8 was achieved for a porous film with an estimated porosity of 40% and average pore size of 3 nm. Electrical and mechanical properties as well as coefficient of thermal expansion for both dense and porous polymer films were measured.

Original language	English
Pages (from-to)	309-313
Number of pages	5
Journal	Journal of Electronic Materials
Volume	30
Issue number	4
DOIs	https://doi.org/10.1007/s11664-001-0036-9
Publication status	Published - 1 Jan 2001

Keywords

Poly(arylene) ethers
Porous polymer film
Ultra-low dielectric constant

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Electrical and Electronic Engineering
Materials Chemistry

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10.1007/s11664-001-0036-9

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title = "Synthesis and characterization of porous polymeric low dielectric constant films",

abstract = "This paper reports the synthesis and dielectric properties of a porous poly(arylether) material with an ultra-low dielectric constant for interlayer dielectric applications in microelectronics. The porous polymer films were successfully fabricated by a method of organic phase separation and evaporation. A dielectric constant k of 1.8 was achieved for a porous film with an estimated porosity of 40% and average pore size of 3 nm. Electrical and mechanical properties as well as coefficient of thermal expansion for both dense and porous polymer films were measured.",

keywords = "Poly(arylene) ethers, Porous polymer film, Ultra-low dielectric constant",

author = "Yuhuan Xu and Zheng, {D. W.} and Yipin Tsai and Tu, {K. N.} and Bin Zhao and Liu, {Q. Z.} and Maureen Brongo and Ong, {Chung Wo} and Choy, {Chung Loong} and Sheng, {George T.T.} and Tung, {C. H.}",

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doi = "10.1007/s11664-001-0036-9",

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T1 - Synthesis and characterization of porous polymeric low dielectric constant films

AU - Xu, Yuhuan

AU - Zheng, D. W.

AU - Tsai, Yipin

AU - Tu, K. N.

AU - Zhao, Bin

AU - Liu, Q. Z.

AU - Brongo, Maureen

AU - Ong, Chung Wo

AU - Choy, Chung Loong

AU - Sheng, George T.T.

AU - Tung, C. H.

PY - 2001/1/1

Y1 - 2001/1/1

N2 - This paper reports the synthesis and dielectric properties of a porous poly(arylether) material with an ultra-low dielectric constant for interlayer dielectric applications in microelectronics. The porous polymer films were successfully fabricated by a method of organic phase separation and evaporation. A dielectric constant k of 1.8 was achieved for a porous film with an estimated porosity of 40% and average pore size of 3 nm. Electrical and mechanical properties as well as coefficient of thermal expansion for both dense and porous polymer films were measured.

AB - This paper reports the synthesis and dielectric properties of a porous poly(arylether) material with an ultra-low dielectric constant for interlayer dielectric applications in microelectronics. The porous polymer films were successfully fabricated by a method of organic phase separation and evaporation. A dielectric constant k of 1.8 was achieved for a porous film with an estimated porosity of 40% and average pore size of 3 nm. Electrical and mechanical properties as well as coefficient of thermal expansion for both dense and porous polymer films were measured.

KW - Poly(arylene) ethers

KW - Porous polymer film

KW - Ultra-low dielectric constant

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U2 - 10.1007/s11664-001-0036-9

DO - 10.1007/s11664-001-0036-9

M3 - Journal article

SN - 0361-5235

VL - 30

SP - 309

EP - 313

JO - Journal of Electronic Materials

JF - Journal of Electronic Materials

IS - 4

ER -

Synthesis and characterization of porous polymeric low dielectric constant films

Abstract

Keywords

ASJC Scopus subject areas

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