Synthesis and characterization of porous polymeric low dielectric constant films

Yuhuan Xu, D. W. Zheng, Yipin Tsai, K. N. Tu, Bin Zhao, Q. Z. Liu, Maureen Brongo, Chung Wo Ong, Chung Loong Choy, George T.T. Sheng, C. H. Tung

Research output: Journal article publicationJournal articleAcademic researchpeer-review

23 Citations (Scopus)


This paper reports the synthesis and dielectric properties of a porous poly(arylether) material with an ultra-low dielectric constant for interlayer dielectric applications in microelectronics. The porous polymer films were successfully fabricated by a method of organic phase separation and evaporation. A dielectric constant k of 1.8 was achieved for a porous film with an estimated porosity of 40% and average pore size of 3 nm. Electrical and mechanical properties as well as coefficient of thermal expansion for both dense and porous polymer films were measured.
Original languageEnglish
Pages (from-to)309-313
Number of pages5
JournalJournal of Electronic Materials
Issue number4
Publication statusPublished - 1 Jan 2001


  • Poly(arylene) ethers
  • Porous polymer film
  • Ultra-low dielectric constant

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry


Dive into the research topics of 'Synthesis and characterization of porous polymeric low dielectric constant films'. Together they form a unique fingerprint.

Cite this