Surface modification of polyimide with excimer UV radiation at wavelength of 126 nm

Wei Chen; J. Zhang; Q. Fang; K. Hu; I.W. Boyd

doi:10.1016/j.tsf.2003.11.153

Surface modification of polyimide with excimer UV radiation at wavelength of 126 nm

Wei Chen, J. Zhang, Q. Fang, K. Hu, I.W. Boyd

Research output: Journal article publication › Conference article › Academic research › peer-review

20 Citations (Scopus)

Abstract

We report the achievement of large area surface modification of polyimide (PI) films by using an excimer lamp at 126 nm. Analysis of the morphology changes and composition of the polymer surface was carried out via SEM, AFM and XPS techniques. SEM and AFM results show that the roughness of the polymer surface increases drastically after a very short UV exposure time, and the morphology change produced by the 126 nm UV lamp is much larger and more efficient than that by 172 nm UV radiation. XPS results suggest that photo-dissociation of imide groups in PI occurs during the 126 nm UV radiation. © 2003 Elsevier B.V. All rights reserved.

Original language	English
Pages (from-to)	3-6
Number of pages	4
Journal	Thin Solid Films
Volume	453-454
DOIs	https://doi.org/10.1016/j.tsf.2003.11.153
Publication status	Published - 1 Apr 2004
Externally published	Yes
Event	Proceedings of Symposium H on Photonic Processing of Surfaces - Strasbourg, France Duration: 10 Jun 2003 → 13 Jun 2003

Keywords

Excimer
Polymer
Surface modification
UV radiation

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1016/j.tsf.2003.11.153

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title = "Surface modification of polyimide with excimer UV radiation at wavelength of 126 nm",

abstract = "We report the achievement of large area surface modification of polyimide (PI) films by using an excimer lamp at 126 nm. Analysis of the morphology changes and composition of the polymer surface was carried out via SEM, AFM and XPS techniques. SEM and AFM results show that the roughness of the polymer surface increases drastically after a very short UV exposure time, and the morphology change produced by the 126 nm UV lamp is much larger and more efficient than that by 172 nm UV radiation. XPS results suggest that photo-dissociation of imide groups in PI occurs during the 126 nm UV radiation. {\textcopyright} 2003 Elsevier B.V. All rights reserved.",

keywords = "Excimer, Polymer, Surface modification, UV radiation",

author = "Wei Chen and J. Zhang and Q. Fang and K. Hu and I.W. Boyd",

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doi = "10.1016/j.tsf.2003.11.153",

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journal = "Thin Solid Films",

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TY - JOUR

T1 - Surface modification of polyimide with excimer UV radiation at wavelength of 126 nm

AU - Chen, Wei

AU - Zhang, J.

AU - Fang, Q.

AU - Hu, K.

AU - Boyd, I.W.

PY - 2004/4/1

Y1 - 2004/4/1

N2 - We report the achievement of large area surface modification of polyimide (PI) films by using an excimer lamp at 126 nm. Analysis of the morphology changes and composition of the polymer surface was carried out via SEM, AFM and XPS techniques. SEM and AFM results show that the roughness of the polymer surface increases drastically after a very short UV exposure time, and the morphology change produced by the 126 nm UV lamp is much larger and more efficient than that by 172 nm UV radiation. XPS results suggest that photo-dissociation of imide groups in PI occurs during the 126 nm UV radiation. © 2003 Elsevier B.V. All rights reserved.

AB - We report the achievement of large area surface modification of polyimide (PI) films by using an excimer lamp at 126 nm. Analysis of the morphology changes and composition of the polymer surface was carried out via SEM, AFM and XPS techniques. SEM and AFM results show that the roughness of the polymer surface increases drastically after a very short UV exposure time, and the morphology change produced by the 126 nm UV lamp is much larger and more efficient than that by 172 nm UV radiation. XPS results suggest that photo-dissociation of imide groups in PI occurs during the 126 nm UV radiation. © 2003 Elsevier B.V. All rights reserved.

KW - Excimer

KW - Polymer

KW - Surface modification

KW - UV radiation

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U2 - 10.1016/j.tsf.2003.11.153

DO - 10.1016/j.tsf.2003.11.153

M3 - Conference article

SN - 0040-6090

VL - 453-454

SP - 3

EP - 6

JO - Thin Solid Films

JF - Thin Solid Films

T2 - Proceedings of Symposium H on Photonic Processing of Surfaces

Y2 - 10 June 2003 through 13 June 2003

ER -

Surface modification of polyimide with excimer UV radiation at wavelength of 126 nm

Abstract

Keywords

ASJC Scopus subject areas

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