Surface modification of polyimide with excimer UV radiation at wavelength of 126 nm

Wei Chen, J. Zhang, Q. Fang, K. Hu, I.W. Boyd

Research output: Journal article publicationConference articleAcademic researchpeer-review

20 Citations (Scopus)

Abstract

We report the achievement of large area surface modification of polyimide (PI) films by using an excimer lamp at 126 nm. Analysis of the morphology changes and composition of the polymer surface was carried out via SEM, AFM and XPS techniques. SEM and AFM results show that the roughness of the polymer surface increases drastically after a very short UV exposure time, and the morphology change produced by the 126 nm UV lamp is much larger and more efficient than that by 172 nm UV radiation. XPS results suggest that photo-dissociation of imide groups in PI occurs during the 126 nm UV radiation. © 2003 Elsevier B.V. All rights reserved.
Original languageEnglish
Pages (from-to)3-6
Number of pages4
JournalThin Solid Films
Volume453-454
DOIs
Publication statusPublished - 1 Apr 2004
Externally publishedYes
EventProceedings of Symposium H on Photonic Processing of Surfaces - Strasbourg, France
Duration: 10 Jun 200313 Jun 2003

Keywords

  • Excimer
  • Polymer
  • Surface modification
  • UV radiation

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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