Suppression of nanoindentation-induced phase transformation in crystalline silicon implanted with hydrogen

Emil V. Jelenković, Suet To

Research output: Journal article publicationJournal articleAcademic researchpeer-review

2 Citations (Scopus)

Abstract

In this paper the effect of hydrogen implantation in silicon on nanoindentation-induced phase transformation is investigated. Hydrogen ions were implanted in silicon through 300 nm thick oxide with double energy implantation (75 and 40 keV). For both energies implantation dose was 4 × 1016cm−2. Some samples were thermally annealed at 400 °C. The micro-Raman spectroscopy was applied on nanoindentation imprints and the obtained results were related to the pop out/elbow appearances in nanoindentatioin unloading-displacement curves. The Raman spectroscopy revealed a suppression of Si-XII and Si-III phases and formation of a-Si in the indents of hydrogen implanted Si. The high-resolution x-ray diffraction measurements were taken to support the analysis of silicon phase formation during nanoindentation. Implantation induced strain, high hydrogen concentration, and platelets generation were found to be the factors that control suppression of c-Si phases Si-XII and Si-III, as well as a-Si phase enhancement during nanoindentation.[Figure not available: see fulltext.].
Original languageEnglish
Pages (from-to)393-397
Number of pages5
JournalElectronic Materials Letters
Volume13
Issue number5
DOIs
Publication statusPublished - 1 Sep 2017

Keywords

  • hydrogen
  • implantation
  • nanoindentation
  • silicon

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

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