@inproceedings{3340fc0d9ab74e6da45b401069d2c036,
title = "Study on range selection of key parameters in bonnet polishing using FEA",
abstract = "Bonnet polishing system is mostly used in rough polishing and fine polishing because of its own features. Due to different aims of polishing stages, optimal ranges of key parameters are different in various polishing stages. Simulations in ANSYS are present in order to get optimal ranges of key parameters including inner pressure P and compression of bonnet H in different polishing stages, firstly, the reliability of simulation of bonnet polishing using ANSYS is verified through a series of simulation about fine polishing stage, on the condition of using ranges of key parameters got by former researchers from polishing experiment; secondly, simulations about rough polishing were carried out, and optimal ranges of key parameters were found, which have reference value in future work.",
keywords = "Bonnet polishing, FEA, Key parameters, Range selection",
author = "Ri Pan and Wang, {Zhen Zhong} and Zhang, {Dong Xu} and Wang, {Chun Jin} and Xie, {Yin Hui} and Guo, {Yin Biao}",
note = "Copyright: Copyright 2013 Elsevier B.V., All rights reserved.; 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies ; Conference date: 26-04-2012 Through 29-04-2012",
year = "2012",
doi = "10.1117/12.970530",
language = "English",
isbn = "9780819490988",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
booktitle = "6th International Symposium on Advanced Optical Manufacturing and Testing Technologies",
}