Study of plasma efficiency as a function of arc current in filtered cathodic vacuum arc systems

B. K. Tay, G. F. You, Shu Ping Lau, D. Sheeja

Research output: Journal article publicationJournal articleAcademic researchpeer-review

2 Citations (Scopus)


Filtered cathodic vacuum arc technology has proven to be an effective method to produce high quality hard coatings. The magnetic filter deployed in this technology is mainly to guide the ionized plasma as well as to prevent the macro-particles reaching the substrates. A filter with high plasma transmission efficiency is essential for a high deposition rate, which is the key to commercialization of the technology. Hence, an investigation has been carried out to study the plasma efficiency of the system under different arc current conditions, which is discussed in this paper. The plasma efficiency tests were carried out on different off-plane double bend (OPDB) filtering systems operated under d.c. or pulse arc current.
Original languageEnglish
Pages (from-to)947-951
Number of pages5
JournalDiamond and Related Materials
Issue number3-7
Publication statusPublished - 1 Mar 2001
Externally publishedYes


  • Characterization
  • Diamond-like carbon
  • Physical vapor deposition
  • Plasma

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Chemistry(all)
  • Mechanical Engineering
  • Materials Chemistry
  • Electrical and Electronic Engineering

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