TY - JOUR
T1 - Study of Electronic and Steric Effects of Different Substituents in Donor–Acceptor Molecules on Multilevel Organic Memory Data Storage Performance
AU - Han, Jinba
AU - Lian, Hong
AU - Cheng, Xiaozhe
AU - Dong, Qingchen
AU - Qu, Yongquan
AU - Wong, Wai Yeung
N1 - Funding Information:
J.H. and H.L. contributed equally to this work. The authors acknowledge the financial support from the National Natural Science Foundation of China (Grant No.: 61774109). This work was also supported by the Youth “Sanjin” Scholar Program, the Key R&D Project of Shanxi Province (International cooperation program, No. 201603D421032), and the Natural Science Foundation of Shanxi Province (Grant No.: 201801D211007). Y.Q. thanks the Hundred Talents Program of Shanxi Province for the financial support. W.‐Y.W. thanks the financial support from the Science, Technology and Innovation Committee of Shenzhen Municipality (JCYJ20180507183413211), the Hong Kong Research Grants Council (PolyU 153058/19P), Hong Kong Polytechnic University (1‐ZE1C) and Ms. Clarea Au for the Endowed Professorship in Energy (847S).
Publisher Copyright:
© 2021 Wiley-VCH GmbH
PY - 2021/4
Y1 - 2021/4
N2 - To study the influence of different types of substituent moieties onto the molecular backbones of conjugated donor–acceptor (D–A) molecules on the thin-film morphology and performance of their memory devices, three new molecules X-TBT were synthesized, which consist of the same backbone of two triphenylamine (T) groups and benzothiadiazole (BT) group, but have different substituents (X) with different electronic effects, that is, cyano group (CN), tert-butyl group (tBu), and methoxy group (OMe). Nonvolatile ternary write-once-read-many-times (WORM) data storage behavior is achieved for the CN-TBT and tBu-TBT based devices as compared to the binary memory characteristic of TBT (X = H). In contrast, OMe-TBT based device still maintains binary WORM behavior due to its unfavorable molecular packing motif and weak intermolecular charge transfer effect, but exhibits the lowest operating voltage (1.4 V) as a result of the lowest energy barrier between electrode and active layer. Notably, the tBu-TBT based device displays the highest ION2/ION1/IOFF ratio of 107:103:1. Altering the substituents in D–A molecules can adjust the molecular packing, thin film morphology, and electron trap depth of the active layer, which then significantly influence the memory performance.
AB - To study the influence of different types of substituent moieties onto the molecular backbones of conjugated donor–acceptor (D–A) molecules on the thin-film morphology and performance of their memory devices, three new molecules X-TBT were synthesized, which consist of the same backbone of two triphenylamine (T) groups and benzothiadiazole (BT) group, but have different substituents (X) with different electronic effects, that is, cyano group (CN), tert-butyl group (tBu), and methoxy group (OMe). Nonvolatile ternary write-once-read-many-times (WORM) data storage behavior is achieved for the CN-TBT and tBu-TBT based devices as compared to the binary memory characteristic of TBT (X = H). In contrast, OMe-TBT based device still maintains binary WORM behavior due to its unfavorable molecular packing motif and weak intermolecular charge transfer effect, but exhibits the lowest operating voltage (1.4 V) as a result of the lowest energy barrier between electrode and active layer. Notably, the tBu-TBT based device displays the highest ION2/ION1/IOFF ratio of 107:103:1. Altering the substituents in D–A molecules can adjust the molecular packing, thin film morphology, and electron trap depth of the active layer, which then significantly influence the memory performance.
KW - donor–acceptor molecules
KW - multilevel memories
KW - organic resistive memories
KW - trap depth
KW - WORM data storage
UR - http://www.scopus.com/inward/record.url?scp=85101455807&partnerID=8YFLogxK
U2 - 10.1002/aelm.202001097
DO - 10.1002/aelm.202001097
M3 - Journal article
AN - SCOPUS:85101455807
SN - 2199-160X
VL - 7
JO - Advanced Electronic Materials
JF - Advanced Electronic Materials
IS - 4
M1 - 2001097
ER -