Study of a super-resolution optical structure: Polycarbonate/ZnS-SiO2/ZnO/ZnS-SiO2/Ge2Sb2 Te5/ZnS-SiO2

W.C. Lin, T.S. Kao, H.H. Chang, Y.H. Lin, Y.H. Fu, C.T. Wu, K.H. Chen, Din-ping Tsai

Research output: Journal article publicationJournal articleAcademic researchpeer-review

39 Citations (Scopus)

Abstract

A new super-resolution near-field optical structure was demonstrated. The structure, polycarbonate/ZnS-SiO2(130 nm)/ZnO(15 nm)/ZnS-SiO2(30 nm)/Ge2Sb2Te5(15 nm)/ ZnS-SiO2(20 nm), has the ability in recording the small marks beyond the diffraction limit. At a readout power of 5 mW, the carrier to noise ratio (CNR) of more than 33 dB was measured for the recorded marks with the size of 100 nm by a digital versatile disc (DVD) tester. Transmission electron microscope (TEM) images of such structure displayed local orderly nanograins in 15 nm ZnO thin film. Ensemble effects of these ZnO nanostructures of the active layer are the key of the near-field super-resolution.
Original languageEnglish
Pages (from-to)1029-1030
Number of pages2
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume42
Issue number2 B
Publication statusPublished - 1 Feb 2003
Externally publishedYes

Keywords

  • Near-field optics
  • Super-resolution near-field structure (super-RENS)
  • ZnO film

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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