Aluminium nitride (AlN) films have been fabricated on Si(100) substrates by an ion-beam-assisted filtered cathodic vacuum arc technique at low temperature. The structural and mechanical properties of the AlN films have been investigated using x-ray photoelectron spectroscopy, by means of an x-ray diffractometer, visible Raman spectroscopy, atomic force microscopy and nanoindentation. The AlN films exhibit a predominant a-axis orientation with hardness as high as 14.5 GPa, which may be suitable for surface acoustic wave devices.
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Acoustics and Ultrasonics
- Surfaces, Coatings and Films