Structural properties and nanoindentation of AlN films by a filtered cathodic vacuum arc at low temperature

X. H. Ji, Shu Ping Lau, G. Q. Yu, W. H. Zhong, B. K. Tay

Research output: Journal article publicationJournal articleAcademic researchpeer-review

29 Citations (Scopus)


Aluminium nitride (AlN) films have been fabricated on Si(100) substrates by an ion-beam-assisted filtered cathodic vacuum arc technique at low temperature. The structural and mechanical properties of the AlN films have been investigated using x-ray photoelectron spectroscopy, by means of an x-ray diffractometer, visible Raman spectroscopy, atomic force microscopy and nanoindentation. The AlN films exhibit a predominant a-axis orientation with hardness as high as 14.5 GPa, which may be suitable for surface acoustic wave devices.
Original languageEnglish
Pages (from-to)1472-1477
Number of pages6
JournalJournal of Physics D: Applied Physics
Issue number10
Publication statusPublished - 21 May 2004
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Acoustics and Ultrasonics
  • Surfaces, Coatings and Films

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