Structural and magnetic properties of iron-nitride thin films deposited using a filtered cathodic vacuum arc

W. H. Zhong; B. K. Tay; Shu Ping Lau; X. W. Sun; S. Li; C. Q. Sun

doi:10.1016/j.tsf.2004.10.003

Structural and magnetic properties of iron-nitride thin films deposited using a filtered cathodic vacuum arc

W. H. Zhong, B. K. Tay, Shu Ping Lau, X. W. Sun, S. Li, C. Q. Sun

Research output: Journal article publication › Journal article › Academic research › peer-review

23 Citations (Scopus)

Abstract

A filtered cathodic vacuum arc technique has been applied to synthesis iron-nitride thin films on silicon (100) substrate. Two approaches were carried out to introduce the nitrogen gas into the chamber to control the nitrogen content. Films with smooth surface containing α-Fe(N), α′-Fe(N), α″-Fe16N2, γ′-Fe4N, ζ-Fe2N, ε-Fe3N and γξ-FeN phases have been obtained, respectively. The magnetic properties of the films show that small amount of nitrogen addition into the iron films increases the saturation magnetization, while excess nitrogen decreases the saturation magnetization. It is explained based on the bond-band-barrier correlation mechanism [C.Q. Sun, Prog. Mater. Sci. 48 (2003) 521] that the electronegative nitrogen changes the valence states of iron into Fe+or Fe dipoles with higher magnetic momentum compared with an neutral Fe atom in the bulk. All rights resvered.

Original language	English
Pages (from-to)	61-66
Number of pages	6
Journal	Thin Solid Films
Volume	478
Issue number	1-2
DOIs	https://doi.org/10.1016/j.tsf.2004.10.003
Publication status	Published - 1 May 2005
Externally published	Yes

Keywords

FCVA
Iron nitride thin films
Magnetic property
Structure

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1016/j.tsf.2004.10.003

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title = "Structural and magnetic properties of iron-nitride thin films deposited using a filtered cathodic vacuum arc",

abstract = "A filtered cathodic vacuum arc technique has been applied to synthesis iron-nitride thin films on silicon (100) substrate. Two approaches were carried out to introduce the nitrogen gas into the chamber to control the nitrogen content. Films with smooth surface containing α-Fe(N), α′-Fe(N), α″-Fe16N2, γ′-Fe4N, ζ-Fe2N, ε-Fe3N and γξ-FeN phases have been obtained, respectively. The magnetic properties of the films show that small amount of nitrogen addition into the iron films increases the saturation magnetization, while excess nitrogen decreases the saturation magnetization. It is explained based on the bond-band-barrier correlation mechanism [C.Q. Sun, Prog. Mater. Sci. 48 (2003) 521] that the electronegative nitrogen changes the valence states of iron into Fe+or Fe dipoles with higher magnetic momentum compared with an neutral Fe atom in the bulk. All rights resvered.",

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AU - Zhong, W. H.

AU - Tay, B. K.

AU - Lau, Shu Ping

AU - Sun, X. W.

AU - Li, S.

AU - Sun, C. Q.

PY - 2005/5/1

Y1 - 2005/5/1

N2 - A filtered cathodic vacuum arc technique has been applied to synthesis iron-nitride thin films on silicon (100) substrate. Two approaches were carried out to introduce the nitrogen gas into the chamber to control the nitrogen content. Films with smooth surface containing α-Fe(N), α′-Fe(N), α″-Fe16N2, γ′-Fe4N, ζ-Fe2N, ε-Fe3N and γξ-FeN phases have been obtained, respectively. The magnetic properties of the films show that small amount of nitrogen addition into the iron films increases the saturation magnetization, while excess nitrogen decreases the saturation magnetization. It is explained based on the bond-band-barrier correlation mechanism [C.Q. Sun, Prog. Mater. Sci. 48 (2003) 521] that the electronegative nitrogen changes the valence states of iron into Fe+or Fe dipoles with higher magnetic momentum compared with an neutral Fe atom in the bulk. All rights resvered.

AB - A filtered cathodic vacuum arc technique has been applied to synthesis iron-nitride thin films on silicon (100) substrate. Two approaches were carried out to introduce the nitrogen gas into the chamber to control the nitrogen content. Films with smooth surface containing α-Fe(N), α′-Fe(N), α″-Fe16N2, γ′-Fe4N, ζ-Fe2N, ε-Fe3N and γξ-FeN phases have been obtained, respectively. The magnetic properties of the films show that small amount of nitrogen addition into the iron films increases the saturation magnetization, while excess nitrogen decreases the saturation magnetization. It is explained based on the bond-band-barrier correlation mechanism [C.Q. Sun, Prog. Mater. Sci. 48 (2003) 521] that the electronegative nitrogen changes the valence states of iron into Fe+or Fe dipoles with higher magnetic momentum compared with an neutral Fe atom in the bulk. All rights resvered.

KW - FCVA

KW - Iron nitride thin films

KW - Magnetic property

KW - Structure

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DO - 10.1016/j.tsf.2004.10.003

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ER -

Structural and magnetic properties of iron-nitride thin films deposited using a filtered cathodic vacuum arc

Abstract

Keywords

ASJC Scopus subject areas

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