Structural and magnetic properties of iron-nitride thin films deposited using a filtered cathodic vacuum arc

W. H. Zhong, B. K. Tay, Shu Ping Lau, X. W. Sun, S. Li, C. Q. Sun

Research output: Journal article publicationJournal articleAcademic researchpeer-review

21 Citations (Scopus)

Abstract

A filtered cathodic vacuum arc technique has been applied to synthesis iron-nitride thin films on silicon (100) substrate. Two approaches were carried out to introduce the nitrogen gas into the chamber to control the nitrogen content. Films with smooth surface containing α-Fe(N), α′-Fe(N), α″-Fe16N2, γ′-Fe4N, ζ-Fe2N, ε-Fe3N and γξ-FeN phases have been obtained, respectively. The magnetic properties of the films show that small amount of nitrogen addition into the iron films increases the saturation magnetization, while excess nitrogen decreases the saturation magnetization. It is explained based on the bond-band-barrier correlation mechanism [C.Q. Sun, Prog. Mater. Sci. 48 (2003) 521] that the electronegative nitrogen changes the valence states of iron into Fe+or Fe dipoles with higher magnetic momentum compared with an neutral Fe atom in the bulk. All rights resvered.
Original languageEnglish
Pages (from-to)61-66
Number of pages6
JournalThin Solid Films
Volume478
Issue number1-2
DOIs
Publication statusPublished - 1 May 2005
Externally publishedYes

Keywords

  • FCVA
  • Iron nitride thin films
  • Magnetic property
  • Structure

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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