Size-tunable, highly sensitive microelectrode arrays enabled by polymer pen lithography

Xinlei Ma; Fengwang Li; Zhuang Xie; Mianqi Xue; Zijian Zheng; Xueji Zhang

doi:10.1039/c6sm02791a

Size-tunable, highly sensitive microelectrode arrays enabled by polymer pen lithography

Xinlei Ma, Fengwang Li, Zhuang Xie, Mianqi Xue, Zijian Zheng, Xueji Zhang

The Hong Kong Polytechnic University

Research output: Journal article publication › Journal article › Academic research › peer-review

13 Citations (Scopus)

Abstract

By combining polymer pen lithography (PPL) patterning with in situ polymerization, we report a straightforward and bottom-up approach for bench-top fabrication of microelectrode arrays (MEAs) with well-controlled dimensions. The as-fabricated MEAs can be used to electrodeposit prussian blue in situ and work as a biosensor for H2O2with a detection limit as low as 5 nM at a sensitivity of 0.7 A cm-2M-1.

Original language	English
Pages (from-to)	3685-3689
Number of pages	5
Journal	Soft Matter
Volume	13
Issue number	20
DOIs	https://doi.org/10.1039/c6sm02791a
Publication status	Published - 1 Jan 2017

ASJC Scopus subject areas

General Chemistry
Condensed Matter Physics

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10.1039/c6sm02791a

Cite this

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abstract = "By combining polymer pen lithography (PPL) patterning with in situ polymerization, we report a straightforward and bottom-up approach for bench-top fabrication of microelectrode arrays (MEAs) with well-controlled dimensions. The as-fabricated MEAs can be used to electrodeposit prussian blue in situ and work as a biosensor for H2O2with a detection limit as low as 5 nM at a sensitivity of 0.7 A cm-2M-1.",

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AU - Li, Fengwang

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AU - Xue, Mianqi

AU - Zheng, Zijian

AU - Zhang, Xueji

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AB - By combining polymer pen lithography (PPL) patterning with in situ polymerization, we report a straightforward and bottom-up approach for bench-top fabrication of microelectrode arrays (MEAs) with well-controlled dimensions. The as-fabricated MEAs can be used to electrodeposit prussian blue in situ and work as a biosensor for H2O2with a detection limit as low as 5 nM at a sensitivity of 0.7 A cm-2M-1.

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DO - 10.1039/c6sm02791a

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ER -

Size-tunable, highly sensitive microelectrode arrays enabled by polymer pen lithography

Abstract

ASJC Scopus subject areas

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