Scanning optical microellipsometer for pure surface profiling

Chung Wah See, Michael Geoffrey Somekh, Richard D. Holmes

Research output: Journal article publicationJournal articleAcademic researchpeer-review

34 Citations (Scopus)

Abstract

We describe a scanning optical interferometer that can simultaneously perform ellipsometry measurements and thus provides a true surface profile. This is accomplished by projecting the back focal plane of the objective lens onto a CCD array. The measured phase differences between the p- and s-polarization components are converted, by using a specially developed algorithm, to optical phase changes caused by material variations. The compensation process is then applied to extract the true profile of the object surface. Experimental results obtained with the system are shown.
Original languageEnglish
Pages (from-to)6663-6668
Number of pages6
JournalApplied Optics
Volume35
Issue number34
DOIs
Publication statusPublished - 1 Dec 1996
Externally publishedYes

Keywords

  • Ellipsometry
  • Interferometry
  • Material-related phase shift
  • Scanning optical profilometry

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Engineering (miscellaneous)

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