Research on parameters of bonnet polishing based on FEA

Chunjin Wang, Wei Yang, Yinbiao Guo, Zhenzhong Wang, Maojiang Zheng

Research output: Chapter in book / Conference proceedingConference article published in proceeding or bookAcademic researchpeer-review

Abstract

In this paper, according to the bonnet polishing technology, in order to get the change regularity of the bonnet's deformation, the inflated deformation model of the bonnet, which is made all of rubber or made of rubber but with a nylon enhancement layer, is established and analyzed by using the FEA simulation. And then, by simulating the process of the bonnet polishing the plane wafer, it achieves the contact pressure curve which varies with the bonnet decrement. According to the Preston equation, k can be acquired through the experiment, v can be achieved through mathematical modeling, and p has been achieved in this paper. Thus, the removal function based on FEA will be acquired.

Original languageEnglish
Title of host publicationMEMS, NANO and Smart Systems
Pages486-490
Number of pages5
DOIs
Publication statusPublished - 2012
Externally publishedYes
Event2011 7th International Conference on MEMS, NANO and Smart Systems, ICMENS 2011 - Kuala Lumpur, Malaysia
Duration: 4 Nov 20116 Nov 2011

Publication series

NameAdvanced Materials Research
Volume403-408
ISSN (Print)1022-6680

Conference

Conference2011 7th International Conference on MEMS, NANO and Smart Systems, ICMENS 2011
Country/TerritoryMalaysia
CityKuala Lumpur
Period4/11/116/11/11

Keywords

  • Bonnet decrement
  • Bonnet polishing
  • Contact pressure
  • FEA
  • Processing parameter

ASJC Scopus subject areas

  • Engineering(all)

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