Keyphrases
Indium Tin Oxide
100%
Near-infrared
100%
Pulsed Laser
100%
Noble Metals
100%
ITO Film
100%
Deposition Conditions
33%
Microstructure
16%
Substrate Temperature
16%
Resistivity
16%
Oxygen Pressure
16%
Spectroscopic Ellipsometry
16%
Crystallinity
16%
Optical Properties
16%
Electrical Properties
16%
Pressure-temperature
16%
Permittivity
16%
Glass Substrate
16%
X-ray Diffraction Pattern
16%
Dielectric Permittivity
16%
High Carrier Concentration
16%
Indium Tin Oxide Thin Film
16%
Real Part
16%
Near-infrared Range
16%
Plasmonic Materials
16%
Pulsed Laser Deposition Technology
16%
Transparent Conductive Materials
16%
Permittivity Variation
16%
Chemical Engineering
Indium
100%
Precious Metal
100%
Tin Oxide
100%
Film
100%
Pulsed Laser Deposition
14%
Spectroscopic Ellipsometry
14%
Material Science
Indium Tin Oxide
100%
Film
66%
Permittivity
33%
Carrier Concentration
11%
Electrical Resistivity
11%
Pulsed Laser Deposition
11%
Diffraction Pattern
11%
Plasmonic Metamaterials
11%
Optical Property
11%
Thin Films
11%