Properties of amorphous ZrOxthin films deposited by filtered cathodic vacuum arc

Daniel H.C. Chua; W. I. Milne; Z. W. Zhao; B. K. Tay; Shu Ping Lau; T. Carney; R. G. White

doi:10.1016/j.jnoncrysol.2003.09.016

Properties of amorphous ZrO_xthin films deposited by filtered cathodic vacuum arc

Daniel H.C. Chua, W. I. Milne, Z. W. Zhao, B. K. Tay, Shu Ping Lau, T. Carney, R. G. White

Research output: Journal article publication › Journal article › Academic research › peer-review

13 Citations (Scopus)

Abstract

The deposition of amorphous zirconium oxide thin films by off-plane double bend filtered cathodic vacuum arc (FCVA) is reported for the first time. The ZrOxgrowth is at room temperature and X-ray diffraction (XRD) showed an amorphous film was deposited. Atomic force microscopy (AFM) confirmed that the film morphology is very smooth. The surface microstructure and interface properties of ZrOxthin films were investigated using monochromatic high-resolution X-ray photoelectron spectroscopy (XPS). From depth profile, it was deduced that the bulk of the film was ∼ZrO1.9and at the interface, O-Zr-Si types of bonds were observed to be present. Such amorphous films were observed to have a high optical bandgap of 5.2 eV and high refractive index of ∼2.0.

Original language	English
Pages (from-to)	185-189
Number of pages	5
Journal	Journal of Non-Crystalline Solids
Volume	332
Issue number	1-3
DOIs	https://doi.org/10.1016/j.jnoncrysol.2003.09.016
Publication status	Published - 15 Dec 2003
Externally published	Yes

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Ceramics and Composites
Condensed Matter Physics
Materials Chemistry

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10.1016/j.jnoncrysol.2003.09.016

Cite this

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title = "Properties of amorphous ZrOxthin films deposited by filtered cathodic vacuum arc",

abstract = "The deposition of amorphous zirconium oxide thin films by off-plane double bend filtered cathodic vacuum arc (FCVA) is reported for the first time. The ZrOxgrowth is at room temperature and X-ray diffraction (XRD) showed an amorphous film was deposited. Atomic force microscopy (AFM) confirmed that the film morphology is very smooth. The surface microstructure and interface properties of ZrOxthin films were investigated using monochromatic high-resolution X-ray photoelectron spectroscopy (XPS). From depth profile, it was deduced that the bulk of the film was ∼ZrO1.9and at the interface, O-Zr-Si types of bonds were observed to be present. Such amorphous films were observed to have a high optical bandgap of 5.2 eV and high refractive index of ∼2.0.",

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T1 - Properties of amorphous ZrOxthin films deposited by filtered cathodic vacuum arc

AU - Chua, Daniel H.C.

AU - Milne, W. I.

AU - Zhao, Z. W.

AU - Tay, B. K.

AU - Lau, Shu Ping

AU - Carney, T.

AU - White, R. G.

PY - 2003/12/15

Y1 - 2003/12/15

N2 - The deposition of amorphous zirconium oxide thin films by off-plane double bend filtered cathodic vacuum arc (FCVA) is reported for the first time. The ZrOxgrowth is at room temperature and X-ray diffraction (XRD) showed an amorphous film was deposited. Atomic force microscopy (AFM) confirmed that the film morphology is very smooth. The surface microstructure and interface properties of ZrOxthin films were investigated using monochromatic high-resolution X-ray photoelectron spectroscopy (XPS). From depth profile, it was deduced that the bulk of the film was ∼ZrO1.9and at the interface, O-Zr-Si types of bonds were observed to be present. Such amorphous films were observed to have a high optical bandgap of 5.2 eV and high refractive index of ∼2.0.

AB - The deposition of amorphous zirconium oxide thin films by off-plane double bend filtered cathodic vacuum arc (FCVA) is reported for the first time. The ZrOxgrowth is at room temperature and X-ray diffraction (XRD) showed an amorphous film was deposited. Atomic force microscopy (AFM) confirmed that the film morphology is very smooth. The surface microstructure and interface properties of ZrOxthin films were investigated using monochromatic high-resolution X-ray photoelectron spectroscopy (XPS). From depth profile, it was deduced that the bulk of the film was ∼ZrO1.9and at the interface, O-Zr-Si types of bonds were observed to be present. Such amorphous films were observed to have a high optical bandgap of 5.2 eV and high refractive index of ∼2.0.

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DO - 10.1016/j.jnoncrysol.2003.09.016

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JO - Journal of Non-Crystalline Solids

JF - Journal of Non-Crystalline Solids

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ER -

Properties of amorphous ZrO_xthin films deposited by filtered cathodic vacuum arc

Abstract

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