Properties of amorphous ZrOxthin films deposited by filtered cathodic vacuum arc

Daniel H.C. Chua, W. I. Milne, Z. W. Zhao, B. K. Tay, Shu Ping Lau, T. Carney, R. G. White

Research output: Journal article publicationJournal articleAcademic researchpeer-review

13 Citations (Scopus)


The deposition of amorphous zirconium oxide thin films by off-plane double bend filtered cathodic vacuum arc (FCVA) is reported for the first time. The ZrOxgrowth is at room temperature and X-ray diffraction (XRD) showed an amorphous film was deposited. Atomic force microscopy (AFM) confirmed that the film morphology is very smooth. The surface microstructure and interface properties of ZrOxthin films were investigated using monochromatic high-resolution X-ray photoelectron spectroscopy (XPS). From depth profile, it was deduced that the bulk of the film was ∼ZrO1.9and at the interface, O-Zr-Si types of bonds were observed to be present. Such amorphous films were observed to have a high optical bandgap of 5.2 eV and high refractive index of ∼2.0.
Original languageEnglish
Pages (from-to)185-189
Number of pages5
JournalJournal of Non-Crystalline Solids
Issue number1-3
Publication statusPublished - 15 Dec 2003
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Condensed Matter Physics
  • Materials Chemistry


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