Properties of a-boron films prepared by low pressure chemical vapour deposition

Chung Wo Ong; K. P. Chik; H. K. Wong

doi:10.1016/0022-3093(89)90719-9

Properties of a-boron films prepared by low pressure chemical vapour deposition

Chung Wo Ong, K. P. Chik, H. K. Wong

Research output: Journal article publication › Journal article › Academic research › peer-review

15 Citations (Scopus)

Abstract

Properties of LPCVD a-B films are found to depend strongly on substrate temperature Ts. Hardness increases but H content and ESR linewidth (Δ) decrease with increasing Ts. Δ decreases with increasing measuring temperature, T. Narrowing of Δ may be due to the higher charge carrier mobility (and therefore motional narrowing) at higher T.

Original language	English
Pages (from-to)	783-785
Number of pages	3
Journal	Journal of Non-Crystalline Solids
Volume	114
Issue number	PART 2
DOIs	https://doi.org/10.1016/0022-3093(89)90719-9
Publication status	Published - 2 Dec 1989
Externally published	Yes

ASJC Scopus subject areas

Ceramics and Composites
Electronic, Optical and Magnetic Materials

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10.1016/0022-3093(89)90719-9

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title = "Properties of a-boron films prepared by low pressure chemical vapour deposition",

abstract = "Properties of LPCVD a-B films are found to depend strongly on substrate temperature Ts. Hardness increases but H content and ESR linewidth (Δ) decrease with increasing Ts. Δ decreases with increasing measuring temperature, T. Narrowing of Δ may be due to the higher charge carrier mobility (and therefore motional narrowing) at higher T.",

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AU - Ong, Chung Wo

AU - Chik, K. P.

AU - Wong, H. K.

PY - 1989/12/2

Y1 - 1989/12/2

N2 - Properties of LPCVD a-B films are found to depend strongly on substrate temperature Ts. Hardness increases but H content and ESR linewidth (Δ) decrease with increasing Ts. Δ decreases with increasing measuring temperature, T. Narrowing of Δ may be due to the higher charge carrier mobility (and therefore motional narrowing) at higher T.

AB - Properties of LPCVD a-B films are found to depend strongly on substrate temperature Ts. Hardness increases but H content and ESR linewidth (Δ) decrease with increasing Ts. Δ decreases with increasing measuring temperature, T. Narrowing of Δ may be due to the higher charge carrier mobility (and therefore motional narrowing) at higher T.

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U2 - 10.1016/0022-3093(89)90719-9

DO - 10.1016/0022-3093(89)90719-9

M3 - Journal article

SN - 0022-3093

VL - 114

SP - 783

EP - 785

JO - Journal of Non-Crystalline Solids

JF - Journal of Non-Crystalline Solids

IS - PART 2

ER -

Properties of a-boron films prepared by low pressure chemical vapour deposition

Abstract

ASJC Scopus subject areas

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