Properties of a-boron films prepared by low pressure chemical vapour deposition

Chung Wo Ong, K. P. Chik, H. K. Wong

Research output: Journal article publicationJournal articleAcademic researchpeer-review

15 Citations (Scopus)

Abstract

Properties of LPCVD a-B films are found to depend strongly on substrate temperature Ts. Hardness increases but H content and ESR linewidth (Δ) decrease with increasing Ts. Δ decreases with increasing measuring temperature, T. Narrowing of Δ may be due to the higher charge carrier mobility (and therefore motional narrowing) at higher T.
Original languageEnglish
Pages (from-to)783-785
Number of pages3
JournalJournal of Non-Crystalline Solids
Volume114
Issue numberPART 2
DOIs
Publication statusPublished - 2 Dec 1989
Externally publishedYes

ASJC Scopus subject areas

  • Ceramics and Composites
  • Electronic, Optical and Magnetic Materials

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