Preparation and electrical properties of (100) Preferred (Ba,Sr)TiO ₃ bilayer thin films derived from pulse laser deposition method

Keyphrases

• Pulsed Laser Deposition 100%
• Electrical Properties 100%
• Leakage Current 100%
• Ba0.6Sr0.4TiO3 100%
• Bilayer Thin Films 100%
• Si Substrate 50%
• Diffraction 50%
• Preferred Orientation 50%
• Raman Spectroscopy 50%
• LaNiO3 50%
• Dielectric Permittivity 50%
• Loss Tangent 50%
• Microwave Dielectrics 50%
• Current Loss 50%
• TiO2-SiO2 50%
• Bilayer Structure 50%
• Small Loss 50%

Material Science

• Laser Deposition 100%
• Titanium Oxide 100%
• Thin Films 100%
• Raman Spectroscopy 33%
• Permittivity 33%
• Dielectric Material 33%