Preparation and characterization of few-layer MoS2nanosheets and their good nonlinear optical responses in the PMMA matrix

Lili Tao, Hui Long, Bo Zhou, Siu Fung Yu, Shu Ping Lau, Yang Chai, Kin Hung Fung, Yuen Hong Tsang, Jianquan Yao, Degang Xu

Research output: Journal article publicationJournal articleAcademic researchpeer-review

74 Citations (Scopus)

Abstract

Due to the relatively weak van der Waals (VDW) force between interlayers, few-layer MoS2nanosheets are prepared using a simple ultrasonic exfoliation method and incorporated into PMMA. The good nonlinear optical (NLO) property of the MoS2/PMMA composite for the nanosecond pulsed laser at both 532 and 1064 nm has been first reported. The size, thickness and atomic structure of MoS2nanosheets have been characterized by transmission electron microscopy (TEM) and atomic force microscopy (AFM). The interesting dependence of interlayer separation with respect to the layer number of MoS2has been successfully quantified. The average interlayer separation of the MoS2nanosheets increases and deviates much from the theoretical value with reducing the layer number. Such few-layer MoS2nanosheets have been homogeneously incorporated into solid-state PMMA, which shows low optical limiting thresholds, 0.4 and 1.3 J cm-2, and low limiting differential transmittance (TC), 2% and 3% for the nanosecond laser operating at 532 nm and 1064 nm, respectively. The results suggest that MoS2nanosheet incorporated PMMA is a promising candidate of the solid NLO material for optical limiting applications.
Original languageEnglish
Pages (from-to)9713-9719
Number of pages7
JournalNanoscale
Volume6
Issue number16
DOIs
Publication statusPublished - 21 Aug 2014

ASJC Scopus subject areas

  • Materials Science(all)

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