Abstract
Hydroxyl radicals ([rad]OH) are the dominant reactive species during most photocatalytic reactions. Therefore, [rad]OH generation as an index could be beneficial in comparing the obtained results in different experimental setup designs, thereby providing new insights for understanding the photocatalytic mechanism. Heterogeneous photo-Fenton like processes are one of the most effective technologies for degradation of organic pollutants through [rad]OH production. Nevertheless, kinetic models that take into account the dependence of the contaminant degradation on [rad]OH generation under homogeneous oxidant supply, are still limited in such processes. In this paper, a photo-Fenton like reagent (FeIII impregnated N-doped TiO2 (FeNT)/H2O2) involving both heterogeneous and homogeneous phases was employed for carbofuran (CBF) degradation, frequently used pesticide in many developing countries from the carbamate group. In addition, a commercial visible LED lamp (Vis LED) with high power output was utilized as an innovative and efficient visible light source to simulate solar energy. Accordingly, a new kinetic model was proposed to predict CBF degradation in the FeNT/H2O2/Vis LED process under high Vis LED light intensities based on intrinsic reaction parameters, including the Vis LED light intensity, FeNT dosage, initial H2O2 concentration, and [rad]OH generation. The developed model was verified and validated successfully under various reaction conditions. However, a standard error ranging from 3% to 15% was observed at extreme cases such as high [FeNT] and I or low [H2O2]0 when comparing model predictions and experimental results. This is due to the use of averaged conditions to forecast the rate constants.
Original language | English |
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Article number | 122930 |
Journal | Chemical Engineering Journal |
Volume | 382 |
DOIs | |
Publication status | Published - 15 Feb 2020 |
Keywords
- Carbofuran
- Fe-N doped TiO
- Hydroxyl radicals
- Impregnation
- Kinetic modeling
- Visible LED
ASJC Scopus subject areas
- General Chemistry
- Environmental Chemistry
- General Chemical Engineering
- Industrial and Manufacturing Engineering