Polymerization of dual ion beam deposited CN_xfilms with increasing N content

Keyphrases

• Film Structure 100%
• Dual-ion 100%
• Ion Beam 100%
• N Content 100%
• High N Content 100%
• Delamination 50%
• Adhesion 50%
• Room Temperature 50%
• Electrical Conductivity 50%
• Single Bond 50%
• Double Bond 50%
• Triple Bond 50%
• CNx Film 50%
• Carbon Nitride 50%
• Debris 50%
• Ion Beam Assisted Deposition 50%
• Infrared Region 50%
• Nanoscratch Test 50%
• N-containing Compounds 50%
• Critical Normal Load 50%

Material Science

• Film 100%
• Polymerization 100%
• Ion Beam Deposition 10%
• Carbon Nitride 10%
• Electrical Conductivity 10%
• Delamination 10%