Polymer pen lithography using dual-elastomer tip arrays

Zhuang Xie, Youde Shen, Xuechang Zhou, Yong Yang, Qing Tang, Qian Miao, Jing Su, Hongkai Wu, Zijian Zheng

Research output: Journal article publicationJournal articleAcademic researchpeer-review

35 Citations (Scopus)


Dual-elastomer tip arrays are developed as a simple and cost-effective approach to significantly improve the uniformity and precision of polymer pen lithography (PPL). Both experiment and mechanical simulation demonstrate that the hard-apex, soft-base tip structure of the dual-elastomer tip array leads to precise control of feature size and reduced variation among different tips over large areas through fine control of the tip deformation. The dual-elastomer tip array is believed to be readily applied to fabricate nano- and microstructures for fundamental study and applications such as bioassays, sensors, optical and electronic devices.
Original languageEnglish
Pages (from-to)2664-2669
Number of pages6
Issue number17
Publication statusPublished - 10 Sep 2012


  • dip-pen nanolithography
  • polymer pen lithography
  • scanning probe lithography
  • soft lithography
  • surface patterning

ASJC Scopus subject areas

  • Biotechnology
  • Biomaterials
  • Engineering (miscellaneous)

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