Plasma-induced highly efficient synthesis of boron doped reduced graphene oxide for supercapacitors

Shaobo Li, Zhaofeng Wang, Hanmei Jiang, Limei Zhang, Jingzheng Ren, Mingtao Zheng, Lichun Dong, Luyi Sun

Research output: Journal article publicationJournal articleAcademic researchpeer-review

65 Citations (Scopus)

Abstract

In this work, we presented a novel route to synthesize boron doped reduced graphene oxide (rGO) by using the dielectric barrier discharge (DBD) plasma technology under ambient conditions. The doping of boron (1.4 at%) led to a significant improvement in the capacitance of rGO and supercapacitors based on the as-synthesized B-rGO exhibited an outstanding specific capacitance.
Original languageEnglish
Pages (from-to)10988-10991
Number of pages4
JournalChemical Communications
Volume52
Issue number73
DOIs
Publication statusPublished - 1 Jan 2016
Externally publishedYes

ASJC Scopus subject areas

  • Catalysis
  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Chemistry(all)
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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