Plasma flow simulation in an off-plane double bend magnetic filter

B. K. Tay, G. F. You, Shu Ping Lau, X. Shi

Research output: Journal article publicationJournal articleAcademic researchpeer-review

13 Citations (Scopus)


A major disadvantage of cathodic arc plasma deposition is the presence of the macroparticles in the plasma. In order to produce high quality defect-free films suitable for hard-disk applications, an off-plane double bend filter (OPDB) has been developed. In this paper the characterization of an OPDB filtered cathodic vacuum arc deposition system is performed. The effects of the system parameters such as filtering field and duct bias on the plasma properties were investigated using Faraday cup, Langmuir and current probes. The experimental results were found to be in good agreement with the simulation results based on an improved drift approximation model.
Original languageEnglish
Pages (from-to)593-597
Number of pages5
JournalSurface and Coatings Technology
Publication statusPublished - 1 Jan 2000
Externally publishedYes

ASJC Scopus subject areas

  • General Chemistry
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry


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