Phase patterning for ohmic homojunction contact in MoTe2

  • Suyeon Cho
  • , Sera Kim
  • , Jung Ho Kim
  • , Jiong Zhao
  • , Jinbong Seok
  • , Dong Hoon Keum
  • , Jaeyoon Baik
  • , Duk Hyun Choe
  • , K. J. Chang
  • , Kazu Suenaga
  • , Sung Wng Kim
  • , Young Hee Lee
  • , Heejun Yang

Research output: Journal article publicationJournal articleAcademic researchpeer-review

Abstract

Artificial van der Waals heterostructures with two-dimensional (2D) atomic crystals are promising as an active channel or as a buffer contact layer for next-generation devices. However, genuine 2D heterostructure devices remain limited because of impurity-involved transfer process and metastable and inhomogeneous heterostructure formation. We used laser-induced phase patterning, a polymorph engineering, to fabricate an ohmic heterophase homojunction between semiconducting hexagonal (2H) and metallic monoclinic (1T') molybdenum ditelluride (MoTe2) that is stable up to 300°C and increases the carrier mobility of the MoTe2 transistor by a factor of about 50, while retaining a high on/off current ratio of 106. In situ scanning transmission electron microscopy results combined with theoretical calculations reveal that the Te vacancy triggers the local phase transition in MoTe2, achieving a true 2D device with an ohmic contact.
Original languageEnglish
Pages (from-to)625-628
Number of pages4
JournalScience
Volume349
Issue number6248
DOIs
Publication statusPublished - 7 Aug 2015
Externally publishedYes

ASJC Scopus subject areas

  • General

Fingerprint

Dive into the research topics of 'Phase patterning for ohmic homojunction contact in MoTe2'. Together they form a unique fingerprint.

Cite this