Keyphrases
Radio Frequency Magnetron Sputtering
100%
Magnetron Sputtering Deposition
100%
YVO4
100%
Passive Q-switching
100%
Q-switched Nd
100%
WS2 Saturable Absorber
100%
Fabrication Methods
50%
Q-switched Laser
50%
Pulse Duration
50%
Repetition Rate
50%
Laser Operation
50%
Absorber
50%
Q-switching
50%
Single Pulse Energy
50%
Sputtering Time
50%
Photonic Devices
50%
Average Output Power
50%
Switching Performance
50%
Diode-pumped
50%
Graphene
50%
High Uniformity
50%
Laser Photonics
50%
Tungsten Disulfide
50%
Few-layer WS2
50%
Engineering
Magnetron
100%
Saturable Absorber
100%
Radio Frequency
100%
Graphene
50%
Fabrication Method
50%
Output Power
50%
Single Pulse
50%
Pulse Energy
50%
Photonic Devices
50%
Absorption Layer
50%
Q Switching
50%
Repetition Rate
50%
Pulse Duration
50%
Material Science
Magnetron Sputtering
100%
Optical Device
50%
Tungsten
50%
Graphene
50%
Physics
Magnetron Sputtering
100%
Optical Device
50%
Graphene
50%
Q Switched Laser
50%