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Oxygen-stoichiometry-dependent microstructural and magnetic properties of CoPt thin films capped with ion-beam-assisted deposited TiO
x
layers
Guijun Li
,
Chi Wah Leung
, Chin Shueh
, Yi Jing Wu
, Ko Wei Lin
, An Cheng Sun
, Jen Hwa Hsu
, Pui To Lai
, Philip W.T. Pong
Department of Applied Physics
The Hong Kong Polytechnic University
Research output
:
Journal article publication
›
Journal article
›
Academic research
›
peer-review
4
Citations (Scopus)
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x
layers'. Together they form a unique fingerprint.
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Keyphrases
Magnetic Properties
100%
Oxygen Stoichiometry
100%
Microstructural Properties
100%
Ion Beam Assisted
100%
CoPt
100%
CoPt Thin Films
100%
Annealing
33%
Grain Boundary
16%
Oxides
16%
Annealing Process
16%
Post-annealing
16%
Coercivity
16%
Structural Phase Transition
16%
Enhanced Coercivity
16%
High Coercivity
16%
TiOx
16%
Magnetic Recording
16%
Oxygen Ratio
16%
Engineering
Thin Films
100%
Coercivity
100%
Reaction Stoichiometry
100%
Face-Centered Cubic
33%
Annealing Process
33%
Excess Amount
33%
Magnetic Recording
33%
Material Science
Magnetic Property
100%
Thin Films
100%
Grain Boundary
50%
Annealing
50%
Oxide Compound
50%