Oxygen-dependent epitaxial growth of Pt(001) thin films on MgO(001) by magnetron sputtering

X. Y. Qiu, R. X. Wang, G. Q. Li, T. Zhang, L. T. Li, M. L. Wei, X. S. Meng, H. Ji, Z. Zhang, C. H. Chan, Jiyan Dai

Research output: Journal article publicationJournal articleAcademic researchpeer-review

8 Citations (Scopus)


The roles of oxygen gas in crystal orientation, surface morphology and electrical resistivity of Pt thin films grown on MgO(001) substrate by magnetron sputtering are studied. With a well-controlled oxygen ratio (15% oxygen) during sputtering deposition with Ar-O2mixture ambient, (001) epitaxial growth of Pt film on MgO substrate is achieved with an epitaxial orientation relationship of (001)Pt//(001)MgO and [100]Pt//[100]MgO. Microstructural and electrical characterizations reveal that the (001) Pt thin films possess very smooth surface and good conductivity. The formation and subsequent decomposition of platinum oxides in the Pt films grown with more than 30% oxygen result in an increase of surface roughness and electrical resistivity. The high-quality Pt(001) film has large potential for integrated electronic device applications.
Original languageEnglish
Pages (from-to)212-217
Number of pages6
JournalApplied Surface Science
Publication statusPublished - 1 Jun 2017


  • Epitaxial growth
  • Microstructure
  • Oxygen ratio
  • Pt film

ASJC Scopus subject areas

  • Surfaces, Coatings and Films


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