Orientation selective growth of MgO films on Si (100) by pulsed laser deposition

Keyphrases

• Pulsed Laser Deposition 100%
• Si(111) 100%
• Selective Growth 100%
• MgO Films 100%
• Orientation Selective 100%
• Si Substrate 50%
• Substrate Temperature 50%
• Buffer Layer 50%
• Ambient Pressure 50%
• Particulate 50%
• Two-step Method 50%
• Si (100) Substrate 50%
• Laser Fluence 50%
• Oriented Films 50%
• Initial Deposition 50%
• Crystal Quality 50%
• Deposition Conditions 50%

Engineering

• Pulsed Laser 100%
• Ambient Pressure 50%
• Substrate Temperature 50%
• Si Substrate 50%
• Deposition Condition 50%
• Laser Fluence 50%
• Crystalline Quality 50%
• Buffer Layer 50%

Material Science

• Pulsed Laser Deposition 100%
• Film 100%
• Magnesium Oxide 100%
• Buffer Layer 20%
• Surface (Surface Science) 20%