Optimization of parameters for bonnet polishing based on the minimum residual error method

Chunjin Wang, Wei Yang, Shiwei Ye, Zhenzhong Wang, Bo Zhong, Yinbiao Guo, Qiao Xu

Research output: Journal article publicationJournal articleAcademic researchpeer-review

8 Citations (Scopus)

Abstract

For extremely high accuracy optical elements, the residual error induced by the superposition of the tool influence function cannot be ignored and leads to medium-high frequency errors. Even though the continuous computer-controlled optical surfacing process is better than the discrete one, which can decrease this error to a certain degree, the error still exists in scanning directions when adopting the raster path. The purpose of this paper is to optimize the parameters used in bonnet polishing to restrain this error. The formation of this error was theoretically demonstrated and will also be further experimentally presented using our newly designed prototype. Orthogonal simulation experiments were designed for the following five major operating parameters (some of them are normalized) at four levels: inner pressure, z offset, raster distance, H-axis speed, and precession angle. The minimum residual error method was used to evaluate the simulations. The results showed the impact of the evaluated parameters on the residual error. The parameters in descending order of impact are as follows: raster distance, z offset, inner pressure, H-axis speed, and precession angle. An optimal combination of these five parameters among the four levels considered, based on the minimum residual error method, was determined.

Original languageEnglish
Article number075108
JournalOptical Engineering
Volume53
Issue number7
DOIs
Publication statusPublished - Jul 2014
Externally publishedYes

Keywords

  • bonnet polishing
  • medium-high frequency error
  • minimum residual error
  • optimization

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Engineering(all)

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