Optimization of key technological parameters in bonnet polishing using FEA

Ri Pan, Zhen Zhong Wang, Chun Jin Wang, Yin Biao Guo, Dong Xu Zhang

Research output: Journal article publicationJournal articleAcademic researchpeer-review

7 Citations (Scopus)

Abstract

Bonnet polishing tool is widely used in rough polishing and fine polishing because of its own features. Ranges of key technological parameters are different in various polishing stages, which related to how the key technological parameters affect the polishing process. In this paper, series of simulations to illustrate the interaction effect of bonnet into work-piece surface using ANSYS are present, aims to get the optimal key technological parameters in rough polishing and fine polishing. It found that the inner pressure of bonnet, the height of bonnet compression, the slant angle of bonnet and bonnet radius are the main factors that influence the features of contacting area, moreover, the former two parameters directly determine the contribution of stress in contacting area. Finally, based on the simulated results, key technological parameters selected are roughly discussed according to the purpose of different polishing stages.

Original languageEnglish
Pages (from-to)373-382
Number of pages10
JournalJournal of the Chinese Society of Mechanical Engineers, Transactions of the Chinese Institute of Engineers, Series C/Chung-Kuo Chi Hsueh Kung Ch'eng Hsuebo Pao
Volume33
Issue number5
Publication statusPublished - Oct 2012
Externally publishedYes

Keywords

  • Bonnet polishing
  • FEA
  • Key technological parameters
  • Optimization

ASJC Scopus subject areas

  • Mechanical Engineering

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