Optimization and fabrication of stitched long-period gratings for gain flattening of ultrawide-band EDFAs

Aping Zhang; Xue Wen Chen; Jin Hua Yan; Zu Guang Guan; Sailing He; Hwa Yaw Tam

doi:10.1109/LPT.2005.859148

Optimization and fabrication of stitched long-period gratings for gain flattening of ultrawide-band EDFAs

Aping Zhang
, Xue Wen Chen
, Jin Hua Yan
, Zu Guang Guan
, Sailing He
, Hwa Yaw Tam

The Hong Kong Polytechnic University

Research output: Journal article publication › Journal article › Academic research › peer-review

18 Citations (Scopus)

Abstract

We present the optimization and fabrication of the stitched long-period fiber gratings (SLPGs) for gain flattening of an ultrawide-band erbium-doped fiber amplifier (EDFA). With an improved genetic algorithm, the gain spectrum of a practical EDFA with bandwidth of 80 nm is flattened within ±0.69 dB by an optimized SLPG. Furthermore, the SLPG is designed specially for a point-by-point grating writing technique. A superior control of the fabrication procedure of the designed SLPG has been demonstrated in the experiment.

Original language	English
Pages (from-to)	2559-2561
Number of pages	3
Journal	IEEE Photonics Technology Letters
Volume	17
Issue number	12
DOIs	https://doi.org/10.1109/LPT.2005.859148
Publication status	Published - 1 Dec 2005

Keywords

Erbium-doped fiber amplifier (EDFA)
Gain flattening
Genetic algorithm (GA)
Long-period fiber gratings (LPGs)

ASJC Scopus subject areas

Electrical and Electronic Engineering
Atomic and Molecular Physics, and Optics
Physics and Astronomy (miscellaneous)

More information

10.1109/LPT.2005.859148

Cite this

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title = "Optimization and fabrication of stitched long-period gratings for gain flattening of ultrawide-band EDFAs",

abstract = "We present the optimization and fabrication of the stitched long-period fiber gratings (SLPGs) for gain flattening of an ultrawide-band erbium-doped fiber amplifier (EDFA). With an improved genetic algorithm, the gain spectrum of a practical EDFA with bandwidth of 80 nm is flattened within ±0.69 dB by an optimized SLPG. Furthermore, the SLPG is designed specially for a point-by-point grating writing technique. A superior control of the fabrication procedure of the designed SLPG has been demonstrated in the experiment.",

keywords = "Erbium-doped fiber amplifier (EDFA), Gain flattening, Genetic algorithm (GA), Long-period fiber gratings (LPGs)",

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T1 - Optimization and fabrication of stitched long-period gratings for gain flattening of ultrawide-band EDFAs

AU - Zhang, Aping

AU - Chen, Xue Wen

AU - Yan, Jin Hua

AU - Guan, Zu Guang

AU - He, Sailing

AU - Tam, Hwa Yaw

PY - 2005/12/1

Y1 - 2005/12/1

N2 - We present the optimization and fabrication of the stitched long-period fiber gratings (SLPGs) for gain flattening of an ultrawide-band erbium-doped fiber amplifier (EDFA). With an improved genetic algorithm, the gain spectrum of a practical EDFA with bandwidth of 80 nm is flattened within ±0.69 dB by an optimized SLPG. Furthermore, the SLPG is designed specially for a point-by-point grating writing technique. A superior control of the fabrication procedure of the designed SLPG has been demonstrated in the experiment.

AB - We present the optimization and fabrication of the stitched long-period fiber gratings (SLPGs) for gain flattening of an ultrawide-band erbium-doped fiber amplifier (EDFA). With an improved genetic algorithm, the gain spectrum of a practical EDFA with bandwidth of 80 nm is flattened within ±0.69 dB by an optimized SLPG. Furthermore, the SLPG is designed specially for a point-by-point grating writing technique. A superior control of the fabrication procedure of the designed SLPG has been demonstrated in the experiment.

KW - Erbium-doped fiber amplifier (EDFA)

KW - Gain flattening

KW - Genetic algorithm (GA)

KW - Long-period fiber gratings (LPGs)

UR - https://www.scopus.com/pages/publications/29244451842

U2 - 10.1109/LPT.2005.859148

DO - 10.1109/LPT.2005.859148

M3 - Journal article

SN - 1041-1135

VL - 17

SP - 2559

EP - 2561

JO - IEEE Photonics Technology Letters

JF - IEEE Photonics Technology Letters

IS - 12

ER -

Optimization and fabrication of stitched long-period gratings for gain flattening of ultrawide-band EDFAs

Abstract

Keywords

ASJC Scopus subject areas

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