Optical properties of titania films prepared by off-plane filtered cathodic vacuum arc

Z. W. Zhao, B. K. Tay, Shu Ping Lau, G. Q. Yu

Research output: Journal article publicationConference articleAcademic researchpeer-review

32 Citations (Scopus)


Amorphous titania thin films were deposited by an off-plane filtered cathodic vacuum arc (FCVA) at a process pressure of 3.0×10-4Torr at room temperature. Core level of Ti 2p3/2(458.3eV) and O 1s (529.9eV) obtained from XPS spectrum and their deviation in binding energy (ΔBE=71.6eV) indicate that only the Ti4+of Ti oxidation state exists in the film and the film was of ideal stoichiometry. The film exhibits good optical properties, such as high transmittance and optical band gap. Moreover, it possesses bulk-like refractive index (up to 2.57 at 550nm) and lower extinction coefficient (∼10-4at 550nm) with smooth surface.
Original languageEnglish
Pages (from-to)543-546
Number of pages4
JournalJournal of Crystal Growth
Issue number3-4 SPEC. ISS.
Publication statusPublished - 1 Aug 2004
Externally publishedYes
EventICMAT 2003, Symposium H, Compound Semiconductors in Electronic - Singapore, Singapore
Duration: 7 Dec 200312 Dec 2004


  • A3. Physical vapor deposition processes
  • B1. Oxides
  • B2. Dielectric materials

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry

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