On the deposition mechanism of a-C:H films by plasma enhanced chemical vapor deposition

Y. H. Cheng, Y. P. Wu, J. G. Chen, X. L. Qiao, C. S. Xie, B. K. Tay, Shu Ping Lau, X. Shi

Research output: Journal article publicationJournal articleAcademic researchpeer-review

36 Citations (Scopus)

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