Novel periodic microstructures fabricated by multi-exposure two-beam interference lithography

Yinbing Bai; Aping Zhang

doi:10.1109/ACP.2010.5682582

Novel periodic microstructures fabricated by multi-exposure two-beam interference lithography

Yinbing Bai
, Aping Zhang

Research output: Chapter in book / Conference proceeding › Conference article published in proceeding or book › Academic research › peer-review

2 Citations (Scopus)

Abstract

Some novel periodic structures with different internal nanopatterns are numerically and experimentally demonstrated based on multi-exposure two-beam interference lithography. Two-dimensional quasi-crystal structures were fabricated with precisely controlled exposure directions and doses. The experiment results show such a fabrication technology is very promising for making diverse large-area submicron structures.

Original language	English
Title of host publication	2010 Asia Communications and Photonics Conference and Exhibition, ACP 2010
Pages	469-470
Number of pages	2
DOIs	https://doi.org/10.1109/ACP.2010.5682582
Publication status	Published - 1 Dec 2010
Externally published	Yes
Event	Asia Communications and Photonics Conference and Exhibition, ACP 2010 - Shanghai, China Duration: 8 Dec 2010 → 12 Dec 2010

Conference

Conference	Asia Communications and Photonics Conference and Exhibition, ACP 2010
Country/Territory	China
City	Shanghai
Period	8/12/10 → 12/12/10

ASJC Scopus subject areas

Surfaces, Coatings and Films

More information

10.1109/ACP.2010.5682582

Cite this

@inproceedings{6db2ffa8c4734694ba03482870144690,

title = "Novel periodic microstructures fabricated by multi-exposure two-beam interference lithography",

abstract = "Some novel periodic structures with different internal nanopatterns are numerically and experimentally demonstrated based on multi-exposure two-beam interference lithography. Two-dimensional quasi-crystal structures were fabricated with precisely controlled exposure directions and doses. The experiment results show such a fabrication technology is very promising for making diverse large-area submicron structures.",

author = "Yinbing Bai and Aping Zhang",

year = "2010",

month = dec,

day = "1",

doi = "10.1109/ACP.2010.5682582",

language = "English",

isbn = "9781424471119",

pages = "469--470",

booktitle = "2010 Asia Communications and Photonics Conference and Exhibition, ACP 2010",

note = "Asia Communications and Photonics Conference and Exhibition, ACP 2010 ; Conference date: 08-12-2010 Through 12-12-2010",

}

Novel periodic microstructures fabricated by multi-exposure two-beam interference lithography. / Bai, Yinbing; Zhang, Aping.
2010 Asia Communications and Photonics Conference and Exhibition, ACP 2010. 2010. p. 469-470 5682582.

Research output: Chapter in book / Conference proceeding › Conference article published in proceeding or book › Academic research › peer-review

TY - GEN

T1 - Novel periodic microstructures fabricated by multi-exposure two-beam interference lithography

AU - Bai, Yinbing

AU - Zhang, Aping

PY - 2010/12/1

Y1 - 2010/12/1

N2 - Some novel periodic structures with different internal nanopatterns are numerically and experimentally demonstrated based on multi-exposure two-beam interference lithography. Two-dimensional quasi-crystal structures were fabricated with precisely controlled exposure directions and doses. The experiment results show such a fabrication technology is very promising for making diverse large-area submicron structures.

AB - Some novel periodic structures with different internal nanopatterns are numerically and experimentally demonstrated based on multi-exposure two-beam interference lithography. Two-dimensional quasi-crystal structures were fabricated with precisely controlled exposure directions and doses. The experiment results show such a fabrication technology is very promising for making diverse large-area submicron structures.

UR - https://www.scopus.com/pages/publications/79851498875

U2 - 10.1109/ACP.2010.5682582

DO - 10.1109/ACP.2010.5682582

M3 - Conference article published in proceeding or book

SN - 9781424471119

SP - 469

EP - 470

BT - 2010 Asia Communications and Photonics Conference and Exhibition, ACP 2010

T2 - Asia Communications and Photonics Conference and Exhibition, ACP 2010

Y2 - 8 December 2010 through 12 December 2010

ER -

Novel periodic microstructures fabricated by multi-exposure two-beam interference lithography

Abstract

Conference

ASJC Scopus subject areas

More information

Other files and links

Fingerprint

Cite this